| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 01 | WO/2026/001655 | TRANSPARENT PHOTORESIST COMPOSITION AND PREPARATION METHOD THEREFOR, PIXEL DEVICE, SEMICONDUCTOR DEVICE, AND MODULE DEVICE | CN2025/099945 | G03F 7/004 | SHENZHEN BRTHRBORDER SEMICONDUCTOR MATERIALS CO.,LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/002466 | OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM, AND METHOD | EP2025/063384 | G03F 7/00 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/002488 | METHOD OF PERFORMING A QUALIFICATION ACTION ON AN EXPOSURE APPARATUS | EP2025/064031 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/002489 | METHOD OF DETERMINING A COMMON POINT IN IMAGES | EP2025/064036 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/002576 | SYSTEMS AND METHODS FOR DESIGN OF A METROLOGY TARGET | EP2025/065560 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/002829 | METHOD AND SYSTEM FOR EVALUATING THE QUALITY OF A PHOTOLITHOGRAPHY MASK | EP2025/067461 | G03F 1/84 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/003159 | SIMULATION-BASED DEFECT AND REPAIR SHAPE DETERMINATION FOR AN OBJECT FOR LITHOGRAPHY | EP2025/068044 | G03F 1/74 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/003904 | PLASMA PROCESSING METHOD | JP2024/022793 | G03F 7/40 | HITACHI HIGH-TECH CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004069 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND PRODUCTION METHOD FOR PRINTED WIRING BOARD | JP2024/023398 | G03F 7/004 | RESONAC CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004373 | POSITIVE PHOTOSENSITIVE COMPOSITION, COPOLYMER, CURED PRODUCT, ELECTRONIC COMPONENT, DISPLAY DEVICE, AND INFORMATION TERMINAL | JP2025/017492 | G03F 7/023 | TORAY INDUSTRIES, INC. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004396 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND PRODUCTION METHOD FOR PRINTED WIRING BOARD | JP2025/018089 | G03F 7/004 | RESONAC CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004403 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND | JP2025/018217 | G03F 7/004 | FUJIFILM CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004462 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JP2025/019356 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004498 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND | JP2025/020014 | G03F 7/11 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004652 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND PRODUCTION METHOD FOR PRINTED WIRING BOARD | JP2025/021478 | G03F 7/075 | RESONAC CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004678 | METHOD FOR FORMING PATTERN ON LAMINATE AND COMPOSITION USED THEREFOR | JP2025/021657 | G03F 7/11 | NISSAN CHEMICAL CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/004680 | METHOD FOR FORMING PATTERN ON LAMINATE AND COMPOSITION USED THEREFOR | JP2025/021670 | G03F 7/11 | NISSAN CHEMICAL CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/005162 | COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAME | KR2024/096697 | G03F 7/004 | SAMSUNG SDI CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/005325 | CURABLE COMPOSITION, CURED FILM PRODUCED USING COMPOSITION, AND COLOR FILTER AND DISPLAY DEVICE COMRISING CURED FILM | KR2025/007661 | G03F 7/033 | SAMSUNG SDI CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/005639 | METHOD FOR MATCHING STRUCTURES OF A LAYOUT OF A MICROELECTRONIC COMPONENT LAYER | RU2024/000204 | G03F 7/075 | AKTSIONERNOE OBSHCHESTVO "SOFIT" | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/006304 | PHOTORESIST SMOOTHENING AND PROTECTION | US2025/035036 | G03F 7/40 | LAM RESEARCH CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/006407 | DEFECT REDUCTION STRATEGIES USING MECHANICAL LEARNINGS FROM MECHANICAL SIMULATION | US2025/035188 | G03F 7/00 | LAM RESEARCH CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 01 | WO/2026/006500 | ASSEMBLY FOR AN ULTRAVIOLET-OZONE CLEANING SYSTEM | US2025/035321 | G03F 1/82 | KLA CORPORATION | PHYSICS | فیزیک | ابزارها |